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REZEK, J., HOUŠKA, J., PROCHÁZKA, M., HAVIAR, S., KOZÁK, T., BAROCH, P. In-Ga-Zn-O thin films with tunable optical and electrical properties prepared by high-power impulse magnetron sputtering. Thin Solid Films, 2018, roč. 658, č. 31 July 2018, s. 27-32. ISSN: 0040-6090
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NOVÁK, P., KOZÁK, T., ŠUTTA, P., KOLEGA, M., BLÁHOVÁ, O. Influence of oxygen on the resistivity of co-sputtered transparent AZO films. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2018, roč. 215, č. 13, s. nestránkováno. ISSN: 1862-6300
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KOELMAN, P., HEIJKERS, S., MOUSAVI, S. T., GRAEF, W., MIHAILOVA, D., KOZÁK, T., BOGAERTS, A., VAN DIJK, J. A comprehensive chemical model for the splitting of CO2 in non-equilibrium plasmas. Plasma Processes and Polymers, 2017, roč. 14, č. 4-5, s. "1600155-1"-"1600155-20". ISSN: 1612-8850
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KOLENATÝ, D., VLČEK, J., KOZÁK, T., HOUŠKA, J., ČERSTVÝ, R. Controlled Reactive HiPIMS – Effective Technique for Low-temperature (300 °C) Synthesis of VO2 Films with Semiconductor-to-metal Transition. Plzeň, 2017.
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VLČEK, J., KOLENATÝ, D., HOUŠKA, J., KOZÁK, T., ČERSTVÝ, R. Controlled reactive HiPIMS - effective technique for low-temperature (300 °C) synthesis of VO2 films with semiconductor-to-metal transition. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2017, roč. 50, č. 38, s. "38LT01-1"-"38LT01-6". ISSN: 0022-3727
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KOLENATÝ, D., VLČEK, J., KOZÁK, T., HOUŠKA, J., ČERSTVÝ, R. Controlled reactive HiPIMS of thermochromic VO2 films at a low deposition temperature (300 °C). Soluň, Řecko, 2017.
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KOLENATÝ, D., VLČEK, J., KOZÁK, T., HOUŠKA, J., ČERSTVÝ, R. Controlled reactive HiPIMS of thermochromic VO2 films at a low deposition temperature (300 °C). San Diego, USA, 2017.
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KOZÁK, T., VLČEK, J. Dynamics of Processes During the Deposition of Oxide Films by Reactive High-power Impulse Magnetron Sputtering - A Modelling Study. Jeju, Korea, 2017.
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KOZÁK, T., VLČEK, J. Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study. Journal of Applied Physics, 2017, roč. 122, č. 4, s. "043304-1"-"043304-9". ISSN: 0021-8979
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KOZÁK, T., VLČEK, J. Modelling the dynamics of processes in reactive HiPIMS deposition of oxide films. Plzeň, 2017.
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NOVÁK, P., BRISCOE, J., KOZÁK, T., KORMUNDA, M., NETRVALOVÁ, M., BACHRATÁ, Š. Optimization of sputtered ZnO transparent conductive seed layer for flexible ZnO-nanorod-based devices. Thin Solid Films, 2017, roč. 634, č. JUL 31 2017, s. 169-174. ISSN: 0040-6090
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BOGAERTS, A., DE BIE, C., SNOECKX, R., KOZÁK, T. Plasma based CO2 and CH4 conversion: A modeling perspective. Plasma Processes and Polymers, 2017, roč. 14, č. 6, s. "e1600070-1"-"e1600070-21". ISSN: 1612-8850
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HOUŠKA, J., KOZÁK, T. Relationships between the distribution of O atoms on partially oxidized metal (Al, Ag, Cu, Ti, Zr, Hf) surfaces and the adsorption energy: A density-functional theory study. Journal of Applied Physics, 2017, roč. 121, č. 22, s. "225303-1"-"225303-10". ISSN: 0021-8979
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NOVÁK, P., BRISCOE, J., KOZÁK, T., BACHRATÁ, Š. Sputtered AZO films for ZnO-nanorod-based piezoelectric nanogenerator. Štrasburk, 2017.
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KOZÁK, T., VLČEK, J. The role of metal implantation in reactive high power impulse magnetron sputtering. Braunschweig, Německo, 2017.
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KOZÁK, T., VLČEK, J. A parametric model for reactive high-power impulse magnetron sputtering of films. Journal of Physics D: Applied Physics, 2016, roč. 49, č. 5, s. 1-18. ISSN: 0022-3727
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BAROCH, P., REZEK, J., KOZÁK, T., HOUŠKA, J. Comparison of HiPIMS and conventional sputtering methods used for preparation of transparent IGZO thin films. Platanias, Řecko, 2016.
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KOLENATÝ, D., VLČEK, J., KOZÁK, T., HOUŠKA, J., ČERSTVÝ, R. Controlled reactive HiPIMS of thermochromic VO2 films at a low deposition temperature (300 °C). Gent, Belgie, 2016.
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VLČEK, J., REZEK, J., BELOSLUDTSEV, A., KOZÁK, T. High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications. Indianapolis, USA, 2016.
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VLČEK, J., REZEK, J., BELOSLUDTSEV, A., KOZÁK, T. High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications. In SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016. ALBUQUERQUE, NM 87122-1914 USA: SOCIETY OF VACUUM COATERS, 2016. s. 135-139. ISBN: 978-1-878068-36-1 , ISSN: 0737-5921
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NOVÁK, P., BRISCOE, J., NETRVALOVÁ, M., KOZÁK, T. OPTIMIZATION OF THIN TRANSPARENT CONDUCTIVE ZNO:AL FILM FOR NANOSTRUCTURED PIEZOELECTRIC ENERGY HARVESTE. Řecko, 2016.
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KOZÁK, T., VLČEK, J. Reactive High-Power Impulse Magnetron Sputtering: Modeling and Applications. San Diego, USA, 2016.
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KOZÁK, T., VLČEK, J. Reactive high power impulse magnetron sputtering: combining simulation and experiments. Bochum, Německo, 2016.
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KOZÁK, T., VLČEK, J. Target and substrate composition in reactive high-power impulse magnetron sputtering - a modelling study. Sheffield, Velká Británie, 2016.
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KOZÁK, T., VLČEK, J. A parametric model for reactive high-power impulse magnetron sputtering. Braunschweig, Německo, 2015.
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BAROCH, P., TÖLG, T., KOZÁK, T., PAJDAROVÁ, A., SAITO, N. Approaches to generate low intensity plasma discharges in liquids. Bangkok, Thajsko, 2015.
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VLČEK, J., REZEK, J., HOUŠKA, J., KOZÁK, T., KOHOUT, J. Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films. Vacuum, 2015, roč. 2015, č. 114, s. 131-141. ISSN: 0042-207X
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HEIJKERS, S., SNOECKS, R., KOZÁK, T., SILVA, T., GODFROID, T., BRITUN, N., SNYDERS, R., BOGAERTS, A. CO2 conversion in a microwave plasma reactor in the presence of N2: elucidating the role of vibrational levels. Journal of Physical Chemistry C, 2015, roč. 119, č. 23, s. 12815-12828. ISSN: 1932-7447
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VLČEK, J., KOZÁK, T., REZEK, J. Controlled Reactive High-power impulse Magnetron Sputtering – Experiments and Modelling. San Diego, USA, 2015.
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KOZÁK, T., VLČEK, J. Dynamics of processes during reactive high-power impulse magnetron sputtering of zirconium dioxide films. Paříž, Francie, 2015.
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VLČEK, J., REZEK, J., BELOSLUDTSEV, A., KOZÁK, T. High-rate reactive high-power impulse magnetron sputtering of oxide films. Paříž, Francie, 2015.
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VLČEK, J., KOZÁK, T., REZEK, J. Reactive high-power impulse magnetron sputtering of films – a process control and modelling. Braunschweig, Německo, 2015.
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KOZÁK, T., VLČEK, J. Effect of the voltage pulse characteristics on high-power impulse magnetron sputtering of copper. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2013, roč. 2013, č. 22, s. 015009-1-015009-9. ISSN: 0963-0252
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REZEK, J., VLČEK, J., HOUŠKA, J., ČERSTVÝ, R., KOZÁK, T., KOHOUT, J. Reactive deposition of zirconium dioxide films using high-power impulse magnetron sputtering. Strasbourg, Francie, 2013.
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REZEK, J., VLČEK, J., HOUŠKA, J., ČERSTVÝ, R., KOZÁK, T., KOHOUT, J. Reactive high-power impulse magnetron sputtering of optically transparent zirconium dioxide films. Braunschweig, Německo, 2013.
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KOZÁK, T., VLČEK, J., KOS, Š. Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges. Journal of Physics D: Applied Physics, 2013, roč. 46, č. 10, s. 1-7. ISSN: 0022-3727
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