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Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy

Citace: [] PAJDAROVÁ, A., VLČEK, J., BĚLSKÝ, P., LEŠTINA, J., MUSIL, J. Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy. In Proceedings of the XIVth Symposium on Application of Plasma Processes. Liptovský Mikuláš : Military Academy , 2003. s. 124-125. ISBN: 8080401950
Druh: STAŤ VE SBORNÍKU
Jazyk publikace: eng
Anglický název: Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy
Rok vydání: 2003
Místo konání: Liptovský Mikuláš
Název zdroje: Military Academy
Autoři: Andrea Dag Pajdarová , Jaroslav Vlček , Petr Bělský , Jan Leština , Jindřich Musil
Abstrakt EN: Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneousputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them.
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