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Citace:
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BURCALOVÁ, K., VLČEK, J., KUDLÁČEK, P., LUKÁŠ, J., MUSIL, J. High-power pulsed magnetron sputtering: model predictions and experimental verification. In Abstracts. Dresden: EFDS e.V., 2006. s. 541-541.
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Druh:
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STAŤ VE SBORNÍKU
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Jazyk publikace:
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eng
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Anglický název:
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High-power pulsed magnetron sputtering: model predictions and experimental verification
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Rok vydání:
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2006
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Místo konání:
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Dresden
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Název zdroje:
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EFDS e.V.
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Autoři:
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Kristýna Burcalová
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Jaroslav Vlček
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Pavel Kudláček
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Jan Lukáš
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Jindřich Musil
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Abstrakt EN:
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In this contribution, a modification of the phenomenological model recently developed by D.J.Christie, together with its experimental verification, are presented. A weak additional ionization of sputtered target atoms in a plasma bulk and an effective magnetic confinemet of electrons between the target and a substrate, reducing ion diffusion losses to a chamber wals, were inclided in the model to explain the experimental results achieved with a newly designed, strongly unbalanced, magnetron system proposed for ionized high-rate sputtering of metallic films.
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Klíčová slova
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