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Ti-Si-N nanocomposite films with a high content of Si

Citace: [] MUSIL, J., ČERSTVÝ, R., DOHNAL, P., ZEMAN, P. Ti-Si-N nanocomposite films with a high content of Si. In Abstracts. Dresden: EFDS e.V., 2006. s. 406-406.
Druh: STAŤ VE SBORNÍKU
Jazyk publikace: eng
Anglický název: Ti-Si-N nanocomposite films with a high content of Si
Rok vydání: 2006
Místo konání: Dresden
Název zdroje: EFDS e.V.
Autoři: Jindřich Musil , Radomír Čerstvý , Pavel Dohnal , Petr Zeman
Abstrakt EN: The article reports on interrelationships between elemental composition, phase composition, structure, mechanical properties and oxidation resistance of Ti-Si-N thin films with a high content of Si. The films were prepared by reactive sputtering in a mixture Ar+N2 using an unbalanced closed-field dual magnetron system operated in pulsed mode. Both magnetrons were equipped with composed targets.
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