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Structural analysis of annealed a-axis oriented ZnO films prepared by RF mangetron sputering

Citace:
NOVÁK, P., ŠUTTA, P., NETRVALOVÁ, M., SAVKOVÁ, J., KOVÁČ, J. Structural analysis of annealed a-axis oriented ZnO films prepared by RF mangetron sputering. Lille, Francie, 2015.
Druh: PŘEDNÁŠKA, POSTER
Jazyk publikace: eng
Anglický název: Structural analysis of annealed a-axis oriented ZnO films prepared by RF mangetron sputering
Rok vydání: 2015
Autoři: Ing. Petr Novák Ph.D. , Doc. RNDr. Pavol Šutta Ph.D. , Ing. Marie Netrvalová Ph.D. , Ing. Jarmila Savková Ph.D. , Jaroslav Kováč
Abstrakt EN: Sputtered ZnO thin films mostly exhibit a strong preferred orientation of crystallites in the [001] direction perpendicular to the substrate surface (c-axis orientation). The preferred orientation of crystallites in the [100] direction (a-axis orientation) is obtained when the sufficient substrate voltage is applied during the deposition. Nevertheless, ions accelerated by voltage of tens or hundreds Volts damage the growing film and thus the post-deposition annealing is needed. We report about structural analysis of sputtered a-axis ZnO films annealed up to 900°C. The film structure was primarily observed by X-Ray Diffractometr equipped with high temperature vacuum chamber. We focus on the effect of the annealing temperature on the size, quality and preferred orientation of crystallites. We found that, while at up to 500°C the ratio between a-axis and c-axis phase is almost constant and only the structure is enhanced, at temperature higher then 500°C transformation from a-axis to c- axis orientation occurs.
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